The UCAM article "Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition " was published inJournal of Vacuum Science & Technology A
The article "Modelling the enthalpy change and transition temperature dependence of the metal–insulator transition in pure and doped vanadium dioxide" , by UCAM was published in the journal Physical Chemistry Chemical Physics
The UCAM article "Preparation of atomic layer deposited vanadium dioxide thin films using tetrakis(ethylmethylamino) vanadium as precursor" was published in
J. Vac. Sci. Technol. A 38, 052402 (2020) in July 2020