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New UCAM article!

The UCAM article "Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition " was published inJournal of Vacuum Science & Technology A

NEW UCAM article

The article "Modelling the enthalpy change and transition temperature dependence of the metal–insulator transition in pure and doped vanadium dioxide" , by UCAM was published in the journal Physical Chemistry Chemical Physics

The UCAM article "Preparation of atomic layer deposited vanadium dioxide thin films using tetrakis(ethylmethylamino) vanadium as precursor" was published in

J. Vac. Sci. Technol. A 38, 052402 (2020) in July 2020

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This project has received funding from the European Union’s Horizon 2020 research and innovation programme under grant agreement No 737109 (PHASE-CHANGE SWITCH).