You are warmly invited to attend this online event hosted by IBM.
Your are welcome to forward this invitation to your
interested co-workers and consortium members
For downloading the program in pdf format please press on: flyer
A new article including VO2 reconfigurable inductors& more was published in IEEE Microwave Magazine by Nanolab
A new article including VO2 reconfigurable inductors was published in IEEE Access by Nanolab
A new article on Ge-doped VO2 RF characteristics was published by Nanaolab and AMO in the ACS journal
The UCAM article "Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition " was published inJournal of Vacuum Science & Technology A